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Add Inventor API Methods To PlanarSketch For Creating Patterns (Rectangular, Circular, Mirror)

Add Inventor API Methods To PlanarSketch For Creating Patterns (Rectangular, Circular, Mirror)

Please add 'Methods' to the PlanarSketch API object (and potentially other types of Sketches) that will give us the ability to create patterns of SketchEntities.  Rectangular, Circular, & Mirror type patterns.  We have been able to create these manually for a long time.  Now it is time to enable us to create then by code.

 

I know we can already create patterns of features or solid bodies within parts by code (RectangularPatternFeaturesCircularPatternFeatures, & MirrorFeatures), and patterns of assembly components within assemblies by code (OccurrencePatterns), so lets finish the circle and give us the ability to create proper patterns within our sketches by code.  Hopefully the new sketch entities created by these new methods will not remain unconstrained (even though that would be a good start, got to start somewhere), but will be fully constrained.  And hopefully all those entities it creates (the pattern) will remain 'controlled / controllable' by some sort of special constraints designed for use with patterns or by some sort of actual sketch pattern objects, like we have for feature patterns and assembly component patterns, so that these patterns can be edited again later, and driven by parameters.

 

(I did several searches within the Inventor Ideas forum, with many keywords and phrases, but could not find another 'Idea' like this one, so I hope it is not a duplicate of another.)

WCrihfield_1-1712862812464.png

 

WCrihfield_0-1712862780277.png

WCrihfield_2-1712862889313.png

 

 

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