I often want a RH and LH assembly, and the "major" part in the two assemblies will be mirror images, and when there are feature patterns on this part that correspond to part instances in the assembly, it makes sense to use a Component Pattern, based on the feature pattern; but in the derived (mirrored) part, the feature pattern(s) is/are not recognised.
It seems that it would not be too big a leap to let that information flow though. I mean, there is no problem with recognising holes as such for the purposes of a hole note in the idw of a derived part.
