Currently, the Mark and Split features in Autodesk Inventor Professional 2026 do not support Rectangular Pattern or Circular Pattern (Polar Pattern) directly.
At the moment, users must create the pattern at the sketch level first and then apply the feature. While this workaround is functional, it adds unnecessary steps and reduces workflow efficiency, especially when design changes are required later.
Suggested Enhancement:Enable the Mark and Split commands to be patterned directly using the standard Rectangular Pattern and Circular Pattern feature tools, similar to other Inventor features.
Benefits:
- Faster and more efficient modeling workflows
- Reduced dependency on complex sketch patterns
- Easier design modifications and maintenance
- Improved feature tree organization and readability
- Consistent behavior with other Inventor features
This enhancement would provide greater flexibility and help users create repetitive mark and split operations more efficiently.